单片IR式净化烧成炉：
- Clean structure with no dust caused by itself
- Far-infrared radiation(IR) heating system has been adopted.
The process with high efficiency is available for various kinds of the film thickness. - The IR panel heater with excellent temperature uniformity has been adopted.
- The uniform heating is available for such a large substrate as the 10th Generation.
- By introducing N2 gas into the oven, it is available to have a heating process under low Oxygen(O2) density.
| Available glass size | ~W3000×L3200mm | |
|---|---|---|
| Temperature range | 80~250℃ | |
| Temperature uniformity | ±3℃ | |
| Cleanliness | Class 10 (0.3μm) | |
| Applications | Baking of Polyimide coating, Annealing, Baking of passivation film, Seal main curing/pre curing |
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