大口径立式炉：
- Flagship model that has achieved semiconductor specification.
- The semiconductor diffusion furnace has been modified to a larger scale For the flat panel display.
- Various kinds of process are available such as vacuum, various kinds of Gas atmosphere (Oxidization, reduction, neutral, & corrosion etc).
| Available glass size | ~W730×L920mm | |
|---|---|---|
| Temperature range | RT~700℃ | |
| Temperature uniformity | ±3℃ | |
| Cleanliness | Class 1 (0.3μm) | |
| Applications | Re-polyimide, Annealing, Baking |
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