感应加热式高速升降温炉：
- Low cost performance by limited function
- Upper cross lamp structure and zone segmentation improved the uniformity of in-plane temperature
- Wafer relation system to improve the uniformity of in-place temperature
- Multi axis clean robot enables high speed and accurate wafer transfer
- Equipped with operator friendly high performance control system
| Outer dimension | W1500×D2300×H2080mm | |
|---|---|---|
| Operation temperature | 400 to 500℃ | |
| Heat up rate | Max.250℃/sec | |
| Lamp layout | Upper cross lamp arrays | |
| Number of control zone | 22 | |
| Wafer size | 300mm | |
| I/O port | 2 | |
| Wafer transfer | single wafer / multi-axis clean robot | |
| Controller | Model RSC1000 | |
| Option | HOST communication(GEM300) |
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