对应300mm Wafer的小型立式炉:
- Large batch, Max 100 wafers batch processing
- Max 16 FOUP stocks
- Excellent temperature control from low to medium high temperature range by use of LGO heater
- High-speed wafer transfer by use of single/five wafers handling robot
- Equipped with operator friendly high performance control system
| Outer dimension | W1250×D3200×H3400mm | |
|---|---|---|
| Heater | LGO heater(ID ø500mm) | |
| Flat zone length | 1040mm | |
| Wafer size | 300mm | |
| Batch size | 100wafers | |
| I/O port | 2 | |
| Number of FOUP stock | 16(standard) | |
| Finger | 5wafers+single wafer | |
| Controller | Model VSC1000 | |
| Option | Forced-cooling system, N2 load lock, HOST communication(GEM300) |
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