正拱形三层爆破片BT-ODV用于中低爆破压力，在腐蚀介质中的应用，密封层隔离了介质，通常密封层用Teflon制作，但也可以由SST高爆等级制作。完整的真空支撑能够使爆破片用于从真空到80%的操作压力。BT-ODV爆破片安装在IG夹持器中。尺寸从DN 20（3 / 4“）到所需求，安装在u-holder单元而ST-ODC盘装入s-holder单元。
MINIMUM BURST PRESSURE
0,015 barg
SIZES
20 - 1400 mm
MAXIMUM PERMISSIBLE OPERATION PRESSURE UP TO:
up to 80%
MOUNTING
In holder with 30°clamping seat or directly between flanges (F-design)
BT-OD
with upper part and sealing membrane
BT-ODR
with upper part, sealing membrane and protection ring
BT-ODV
with upper part, sealing membrane and vacuum support
BT-RODV
with protection ring, upper part, sealing membrane and vacuum support
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