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SnSe 硒化锡晶体 (Tin Selenide)

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更新时间:2022-06-05 10:40:03浏览次数:21次

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In the bulk form SnSe has band-gap at around 0.9 eV (indirect) and 1.25 direct gaps. It has layered structure (lamellar) with weak interlayer coupling, enabling to isolate down to monolayers.

In the bulk form SnSe has band-gap at around 0.9 eV (indirect) and 1.25 direct gaps. It has layered structure (lamellar) with weak interlayer coupling, enabling to isolate down to monolayers. Each monolayer is four atoms thick (Se-Sn-Sn-Se) that is roughly 0.9-1.0 nm. At high pressures it undergo semiconductor to superconductor transition. More recently, SnSe has been shown to display world record performance for thermoelectric material efficiency.

SnSe single crystal characteristics

In the bulk form SnSe has band-gap at around 0.9 eV (indirect) and 1.25 direct gaps. It has layered structure (lamellar) with weak interlayer coupling, enabling to isolate down to monolayers. Each monolayer is four atoms thick (Se-Sn-Sn-Se) that is roughly 0.9-1.0 nm. At high pressures it undergo semiconductor to superconductor transition. More recently, SnSe has been shown to display world record performance for thermoelectric material efficiency.

SnSe single crystal characteristics

 

二硒化锆晶体(百分之99.995) ZrSe2

二硒化锆晶体 ZrSe2 (Zirconium Selenide)$r

硒化钨钼晶体(百分之99.995) MoWSe2

硒化钨钼晶体 MoWSe2(Molybdenum Tungsten D

硫硒化钼晶体(百分之99.995)MoSSe

晶体尺寸:~6毫米$r$n电学性能:半导体$r$n晶体结构:六边形$r

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